发明名称 POLISHING MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing material, which has high hardness and enables easy grain size control, and thus is appropriate for precise polishing. <P>SOLUTION: The polishing material has a carbon fiber structure in the form of a three dimensional network composed of carbon fibers with an external diameter ranging from 15 to 100 nm. In an embodiment of the carbon fiber structure, a plurality of the carbon fibers extend from granular parts where the carbon fibers bind to each other. The granular parts are formed in a growth process of the carbon fibers. The polishing material contains such carbon fiber structure and/or a ground product thereof in the form of abrasive grains. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007138048(A) 申请公布日期 2007.06.07
申请号 JP20050334888 申请日期 2005.11.18
申请人 BUSSAN NANOTECH RESEARCH INSTITUTE INC 发明人 HOCKE HEIKO;OKUBO TAKESHI
分类号 C09K3/14;B24D3/00;C01B31/00 主分类号 C09K3/14
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