| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for rapidly and adequately performing correspondence when an exposure device is changed. <P>SOLUTION: The method comprises a process S1 for regulating the mask pattern of a photomask for a first exposure device; a process S2 for regulating a plurality of exposure conditions to be set in a second exposure device; a process S3 for predicting the projection image of the mask pattern to be projected on a substrate by the second exposure device concerning the respective exposure conditions; a process S4 for predicting the work pattern of a substrate surface, based on the projection image, concerning the respective exposure conditions; a process S7 for determining whether or not the work pattern satisfies a prescribed condition concerning the respective exposure conditions; and a process S11 for determining that the photomask is applied to the second exposure device, when the work pattern satisfies the prescribed condition concerning at least one exposure condition. <P>COPYRIGHT: (C)2007,JPO&INPIT |
