发明名称 ELECTRON-BEAM DRAWING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an electron beam drawing apparatus which can perform verification of mass map data. <P>SOLUTION: A data control section 20 operates drawing data obtained from a drawing data storage section 50 to generate data for controlling an electron beam drawing apparatus. The data control section 20 comprises a section 70 for receiving and restoring the drawing data obtained from the drawing data storage section 50, a data operating section 80 performing filter operation of restored data to generate map data, and a shot control section 90 for generating figure drawing shot data with reference to the map data. A temporary storage section 100 connected with the pipeline of the data operating section 80 stores the map data temporarily and transfers it to the drawing data storage section 50. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007141880(A) 申请公布日期 2007.06.07
申请号 JP20050329159 申请日期 2005.11.14
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 YASUMOTO HIDEKI;ANDO MASAAKI;TOMIYOSHI CHIKAO;WAKITA MINORU;OBARA NOBUHIRO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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