<p>A plasma source for microelectronic technology includes at least two inductive coupling coils which define a three-dimensional coil by series connection or parallel connection of the coils. The magnetic intensity excited by the three-dimensional coil is more uniform than magnetic intensity excited by a planar coil. So the three-dimensional coil can excite more uniform plasma, and at the same time, it also can reduce the dependence on gas pressure.</p>
