发明名称 STAGE DEVICE, ELECTRON BEAM IRRADIATION DEVICE AND EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a stage device which can reduce vibration caused by change of velocity of a stage, an electron beam irradiation device, and an exposure device. <P>SOLUTION: In the stage device, a stage (101) which moves along a guide rail (105) is driven and controlled. It changes in response to change of frictional force applied to the stage (101), has a correction table (113a) which stores a control amount driving and controlling the stage as a function of a position and velocity of the stage (101), and controls a driving torque driving the stage (101) by using the correction table (113a). <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007142093(A) 申请公布日期 2007.06.07
申请号 JP20050332828 申请日期 2005.11.17
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NAKAMURA MITSUHIRO;FUJII KEN;SHIMADA HAJIME
分类号 H01L21/027;G03F7/20;G05D3/12;G21K5/00;G21K5/04;H01L21/68 主分类号 H01L21/027
代理机构 代理人
主权项
地址