发明名称 Method for manufacturing semiconductor device
摘要 First semiconductor integrated circuits and second semiconductor integrated circuits arranged over a first substrate so that each of the second semiconductor integrated circuits is adjacent to one of the first semiconductor integrated circuits are transferred to additional substrates through multiple transfer operations. After the first semiconductor integrated circuits and the second semiconductor integrated circuits formed over the first substrate are transferred to the additional substrates (a fourth substrate and a fifth substrate) respectively, the circuits are divided into a semiconductor device corresponding to each semiconductor integrated circuit. The first semiconductor integrated circuits are arranged while keeping a distance from each other over the fourth substrate, and the second semiconductor integrated circuits are arranged while keeping a distance from each other over the fifth substrate. Thus, a large division margin of each of the fourth substrate and the fifth substrate can be obtained.
申请公布号 US2007128747(A1) 申请公布日期 2007.06.07
申请号 US20060602261 申请日期 2006.11.21
申请人 SEMICONDUCTOR ENERGY LABORATORY CO. 发明人 TAMURA TOMOKO;AOKI TOMOYUKI;TSURUME TAKUYA;DAIRIKI KOJI
分类号 H01L21/00 主分类号 H01L21/00
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