发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To facilitate the manufacture of a semiconductor, by irradiating neutron onto a diamond thin film into an N type semiconductor. CONSTITUTION:Besides 6C<12>1, a little over 1% of 6C<12>2 exists in carbon the constituent of diamond and can be changed into 7N<14> by irradiating neutrons onto this atom. Since 7N<14> is a 5 group atom, it functions as the donor resulting in the generation of conductive electons 4, and accordingly the diamond thin film turns into an N type semiconductor. Since the diamond thin film can be easily changed into an N type semiconductor in this manner, this method is very useful to the manufacture of a diamond thin film semiconductor device.
申请公布号 JPS58140116(A) 申请公布日期 1983.08.19
申请号 JP19820023058 申请日期 1982.02.16
申请人 SUWA SEIKOSHA KK 发明人 OGATA TOSHIAKI
分类号 H01L21/261;H01L21/26;(IPC1-7):01L21/26 主分类号 H01L21/261
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