| 摘要 |
<p>Provided is a resist composition, which imparts improved solubility to a resist during the preparation thereof, increases adhesion of a resist layer during development, and shows improved stability and safety. The resist composition comprises a resist material and an organic solvent, wherein the organic solvent contains cyclohexanol acetate. The resist composition optionally further comprises cyclohexanol as an organic solvent. The resist composition further comprises at least one solvent selected from the group consisting of alkyl carboxylates, aliphatic ketones, glycol ethers and glycol ether acetates.</p> |
