发明名称 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 A semiconductor memory device and its manufacturing method are provided to prevent the damage of an adjacent fuse due to the irradiation of a laser beam onto an unwanted portion by forming a barrier layer made of metal on both sides of a corresponding fuse. A semiconductor memory device includes fuses, an upper interlayer dielectric, and a metal barrier layer. The fuses(122a,122b) are formed on a lower interlayer dielectric. The upper interlayer dielectric is used for covering the fuses. The metal barrier layer(142) includes an opening portion for exposing partially each fuse to the outside, so that the metal barrier layer covers both sides of each fuse. The fuses are made of metal.
申请公布号 KR20070056417(A) 申请公布日期 2007.06.04
申请号 KR20050115004 申请日期 2005.11.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JAE HUN
分类号 H01L21/82 主分类号 H01L21/82
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