FABRICATION OF TWO-DIMENSIONAL ARRAY OF NANO SIZED FERROMAGNETS

摘要

A method for manufacturing a two-dimensional array structure of a nano-sized ferromagnet is provided to improve the precision of fabrication by enhancing the resolution of nano patterning using a C60 fullerene based carbon thin film. A ferromagnetic film(12) is formed on a substrate(11). An amorphous carbon thin film(14) is deposited on the ferromagnetic film. An electron beam is irradiated onto the amorphous carbon thin film. At this time, the amorphous carbon thin film is selectively crystallized. The remaining amorphous carbon thin film is removed from the resultant structure to complete a crystallized carbon thin film pattern(14a). A nano-sized ferromagnetic array(12') is formed on the resultant structure by etching the ferromagnetic film using the carbon thin film pattern as an etch mask. Then, the carbon thin film pattern is removed. A C60 fullerene based carbon thin film is used as the carbon thin film.