| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist material, especially, a resist material such as a chemical amplification positive resist material having high etching resistance by having high resolution exceeding the conventional positive resist material and having excellent pattern shape after exposure and to provide a pattern-forming method. <P>SOLUTION: The chemical amplification positive resist material includes a polymer compound in which a weight average molecular weight having a repeating unit shown by formula (1) is 1,000-500,000. <P>COPYRIGHT: (C)2007,JPO&INPIT |
