发明名称 CUTTING METHOD OF QUARTZ SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a cutting method of a quartz substrate constituted so as not to almost discharge cut refuse in the cutting of the quartz substrate. <P>SOLUTION: The cutting method of the quartz substrate has a process for measuring the thickness of the quartz substrate 1 set to a laser processing device 20, a process for adjusting the condensing point 45 in the quartz substrate 1 of a laser beam 23 being a femtosecond laser and a process for scanning the laser beam 23 in order to form a modified region 50 along a cutting schedule position. In the process for scanning laser beam 23, the condensing point 45 is successively moved three times in the thickness direction of the quartz substrate 1 to form the modified region 50 to the whole surface of the quartz substrate 1 in its thickness direction. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007130768(A) 申请公布日期 2007.05.31
申请号 JP20050323175 申请日期 2005.11.08
申请人 SEIKO EPSON CORP 发明人 KUROKI YASUNOBU;UMETSU KAZUNARI
分类号 B28D5/00;B23K26/40;H01L41/09;H01L41/18;H01L41/22;H01L41/335;H03H3/08 主分类号 B28D5/00
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