发明名称 CHARGED PARTICLE BEAM OPTICAL APPARATUS, AND METHOD OF CONTROLLING CHARGED PARTICLE BEAM
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam optical apparatus capable of reducing spreading of a charged particle beams due to aberration on an image surface. SOLUTION: The charged particle beam optical apparatus detects electrons obtained from a sample irradiated with a primary charged particle beam from a charged particle source as a secondary charged particle beam. The charged particle beam optical apparatus includes a primary optical system which irradiates a rectangular region extending in the X-axis direction to the sample with the primary charged particle beam, and a secondary optical system which allows to detect the second charged particle beam on a detection surface emitted from the sample via an aperture diaphragm, wherein the shape of the aperture is formed in elliptical having the major axis in the Y-axis direction perpendicular to the X-axis direction. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007134338(A) 申请公布日期 2007.05.31
申请号 JP20060310266 申请日期 2006.11.16
申请人 EBARA CORP;NIKON CORP 发明人 NIN TAKEAKI
分类号 H01J37/153;H01J37/09 主分类号 H01J37/153
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