LITHOGRAPHIC PROJECTION APPARATUS, SUPPORTING ASSEMBLY, AND METHOD OF MANUFACTURING SAME

摘要

PROBLEM TO BE SOLVED: To remove the adverse influence to be exerted upon positioning accuracy of a wafer or a mask.

SOLUTION: A supporting assembly for use in a lithographic projection apparatus includes a moveable member which is journalled in a housing such that substantially no vibration forces are transmitted between the moveable member and the housing. The assembly comprises a gas filled pressure chamber in which the gas in the pressure chamber acts on the moveable member so as to at least partially counteract the force due to the weight of the moveable member and any other object which it carries. The pressure chamber is supplied with gas and the whole assembly is constructed and arranged such that substantially no gas flows through the pressure chamber when the moveable member is substantially stationary.

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