摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which supplies microwave energy to a plurality of cavity resonators from one microwave power supply, can treat an article to be film-formed in a short period of time by using plasma, and can constantly apply a stable microwave electric power to the article. SOLUTION: The plasma treatment apparatus is directed at converting a source gas into plasma by using the microwave energy and forming a thin film on the surface of a hollow container; and comprises at least one isolator for preventing the interference of a microwave, and at least one external magnetic control means for controlling the isolator. COPYRIGHT: (C)2007,JPO&INPIT
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