| 摘要 |
PROBLEM TO BE SOLVED: To provide a visible light sensitive positive resin composition, to be used for a photoresist material, superior in solubility in solvents, dissolution speed, acid diffusivity transparency, and heat stability by using a specified copolymer. SOLUTION: The visible light sensitive positive resin composition comprising a photosensitive resin, an olefinic unsaturated compound having ether bond, a photoacid-generator, and a photosensitizer contains as the photosensitive resin, the copolymer of structural units each represented by formulae I-III, in which a=0.05∼0.7, b=0.15∼0.8, and c-0.01∼0.5, and a+b+c=1; R1 is an H atom or a methyl group; and R2 is a 1-6C straight or branched and optionclly substituted alkyl or 1-6C straight or branched hydroxyalkyl group. |
