PHOTOMASK AND METHOD OF FABRICATING THE SAME

摘要

A photomask and a method for the fabrication thereof are provided to prevent the capillary phenomenon from occurring so as to facilitate the resolution of a minute line width. The photomask for forming a pattern on which a plurality of patterns are arranged to be adjacent to each other comprises a transparent substrate(700); a phase shift film pattern(712) which is arranged to correspond to the plurality of patterns on the transparent substrate(700) and is formed at a pitch greater than that of the patterns on a portion that a space between the patterns is relatively broader; and a light shielding film pattern(722) which is arranged at the equal pitch to correspond to the plurality of patterns on the phase shift film pattern(712).