发明名称 Semiconductor device with mushroom electrode and manufacture method thereof
摘要 A semiconductor device has: a semiconductor substrate having a pair of current input/output regions via which current flows; an insulating film formed on the semiconductor substrate and having a gate electrode opening; and a mushroom gate electrode structure formed on the semiconductor substrate via the gate electrode opening, the mushroom gate electrode structure having a stem and a head formed on the stem, the stem having a limited size on the semiconductor substrate along a current direction and having a forward taper shape upwardly and monotonically increasing the size along the current direction, the head having a size expanded stepwise along the current direction, and the stem contacting the semiconductor substrate in the gate electrode opening and riding the insulating film near at a position of at least one of opposite ends of the stem along the current direction.
申请公布号 US7223645(B2) 申请公布日期 2007.05.29
申请号 US20040768092 申请日期 2004.02.02
申请人 FUJITSU QUANTUM DEVICES LIMITED 发明人 MAKIYAMA KOZO;IKECHI NAOYA;TAN TAKAHIRO
分类号 H01L21/338;H01L21/027;H01L21/28;H01L21/44;H01L29/417;H01L29/423;H01L29/43;H01L29/47;H01L29/49;H01L29/78;H01L29/812;H01L29/872 主分类号 H01L21/338
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