APPARATUS FOR TREATING SUBSTRATE

摘要

A substrate processing apparatus is provided to perform a predetermined treatment on a large sized substrate and to perform the substrate treatment in a uniform temperature range by using a plurality of sub-processing modules separated from each other. A substrate processing apparatus includes a loading/driving unit and a processing module. The loading/driving unit(10) is used for loading stably a treatment object substrate and moving the substrate in a first direction. The processing module is installed on the loading/driving unit. The processing module is composed of a plurality of sub-processing modules(20a,20b,20c) spaced apart from each other. The processing module is used for supplying plasma reactants onto the substrate.