发明名称 METHOD FOR FORMING INORGANIC ALIGNMENT FILM
摘要 A method of forming an inorganic alignment film on a base substrate is provided comprising forming a film made substantially of an inorganic material on the base substrate, and irradiating ion beams onto the surface of the film from a direction inclined at a predetermined angle theta<SUB>b </SUB>with respect to the direction vertical to the surface. By irradiating the ion beams onto the film, concave portions having a predetermined directivity are formed on the film. The predetermined angle theta<SUB>b </SUB>is preferably 2° or more.
申请公布号 KR100722073(B1) 申请公布日期 2007.05.25
申请号 KR20040069723 申请日期 2004.09.01
申请人 发明人
分类号 G02F1/1337;C23C14/10;C23C14/34;C23C14/58 主分类号 G02F1/1337
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