发明名称 SYSTEM AND METHOD FOR PRINTING ON SUBSTRATES WITH AQUEOUS INKS THAT CAN BE CURED BY MEANS OF ELECTRON BEAM RADIATION
摘要 The invention relates to a system and method for printing on substrates with aqueous inks that can be cured by means of electron beam radiation. The inventive system comprises printing stations (3, 3a) for the wet-on-wet printing of different inks (8) on a first substrate (1) with a first surface tension, a roller pressing station (4) for positioning and pressing a second substrate (2) with a second surface tension against the printed face of the first substrate (1), a curing station (5) for irradiating an electron beam onto the first and second stacked substrates (1, 2) and the inks (8) therebetween in order to cure the inks (8), and a separation station (6) for separating the second substrate (2) from the first substrate (1). The cured inks (8) remain affixed to the first substrate (1) or the second substrate (2) depending on the relationship between the first and second surface tensions of said two substrates (1, 2).
申请公布号 WO2007039656(A3) 申请公布日期 2007.05.24
申请号 WO2006ES00547 申请日期 2006.09.29
申请人 SERVIFLEX, SL;DAVILA CASITAS, JUAN 发明人 DAVILA CASITAS, JUAN
分类号 B41M1/18;B41F3/00;B41M7/00 主分类号 B41M1/18
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