发明名称 METHOD FOR INSPECTING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for inspecting a semiconductor device capable of accurately and easily inspecting a chip pattern formed in a wafer. SOLUTION: The method for inspecting the semiconductor device includes the steps of: inspecting by contacting a probe to a pad of a contact check pattern formed in the wafer with the chip pattern; and inspecting by contacting the probe to the pad of the chip pattern if the inspection result is within the predetermined range. As the contact check pattern, the one is used having the same dimension as the chip pattern, having an appearance different from that of the chip pattern, and having the pad having the same pattern as the pad of the chip pattern. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007129108(A) 申请公布日期 2007.05.24
申请号 JP20050321510 申请日期 2005.11.04
申请人 MITSUBISHI ELECTRIC CORP 发明人 KATO TAKAYUKI
分类号 H01L21/66;H01L21/027 主分类号 H01L21/66
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