| 摘要 |
Sealing structure provided between a transfer chamber and a chamber, such as a process chamber, connected to the transfer chamber includes an insert member, a docking member, and annular seals. The insert member is fixed to the exterior of the transfer chamber and the docking member is fixed to the insert member. The docking member has an extension received in a passageway of the process chamber, a support portion received in the insert member, and a flange received in a passageway of the transfer chamber. The extension, support portion and flange have different outer diameters in cross section such that inclined surfaces extend between the outer peripheral surfaces of the flange, the support portion and the extension. The annular seals are disposed along the inclined surfaces, and the extension prevents the annular seal from being damaged by plasma used to process a substrate in the process chamber.
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