| 摘要 |
A method of purifying an organometallic compound comprising i) providing a mixture comprising a) an organometallic compound chosen from unsymmetrical dimethyl hydrazine and a compound of the formula R<1>R<2>n-1M<1> wherein R<1> is chosen from (C1-C20)alkyl, (C2-C12)dialkylamino, (C1-C12)alkylamino(C1-C12)alkyl, di(C1-C20)alkylamino(C1-C12)alkyl, (C2-C20)alkenyl, (C2-C20)alkenyl and aryl; each R<2> is independently chosen from hydrogen, (C1-C20)alkyl, (C2-C12)dialkylamino, (C1-C12)alkylamino(C1-C12)alkyl, di(C1-C20)alkylamino(C1-C12)alkyl, (C2-C20)alkenyl, (C2-C20)alkenyl, aryl and halogen; M<1> is a Group IIA to Group VIA metal; and n is the valence of M<1>; and b) a purifying composition comprising an alkyl-metal compound of the formula R<3>xR<4>3-xM<2> wherein R<3> is a (C1-C20)alkyl; each R<4> is independently chosen from hydrogen and halogen; M<2> is a Group IIIA metal; and x is an integer from 1-3; and a catalyst compound; and ii) heating the mixture. Preferably, the alkyl-metal compound is a trialkylaluminium compound and the catalyst is a Group (III) halide. The purification method results in an organometallic compound of higher purity than prior art methods. The compounds find use in the vapour deposition of metal-containing films. |
