| 发明名称 |
Removal of titanium nitride with xenon difluoride |
| 摘要 |
TiN is at least partially removed, especially selectively etched, from silicon dioxide (quartz) and SiN surfaces by contact with XeF 2 to selectively convert the TiN to a volatile species. XeF 2 can be preformed or formed in situ by reaction between Xe and a fluorine compound.
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| 申请公布号 |
EP1788120(A1) |
申请公布日期 |
2007.05.23 |
| 申请号 |
EP20060255881 |
申请日期 |
2006.11.17 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
WU, DINGJUN;KARWACKI, EUGENE JOSEPH, JR. |
| 分类号 |
C23C16/44;B08B7/00;H01L21/00 |
主分类号 |
C23C16/44 |
| 代理机构 |
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