发明名称 Processes for treating halogen-containing gases
摘要 There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F<SUB>2 </SUB>that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.
申请公布号 US7220396(B2) 申请公布日期 2007.05.22
申请号 US20030341783 申请日期 2003.01.13
申请人 BATTELLE MEMORIAL INSTITUTE 发明人 AARDAHL CHRISTOPHER L.;ORTH RICK J.;RAPPE KENNETH G.;LESSOR DELBERT L.;JOSEPHSON GARY B.
分类号 B01D53/50;B01D53/32;B01D53/68;B01D53/70;B01D53/79;C10L 主分类号 B01D53/50
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