发明名称 |
Processes for treating halogen-containing gases |
摘要 |
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F<SUB>2 </SUB>that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.
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申请公布号 |
US7220396(B2) |
申请公布日期 |
2007.05.22 |
申请号 |
US20030341783 |
申请日期 |
2003.01.13 |
申请人 |
BATTELLE MEMORIAL INSTITUTE |
发明人 |
AARDAHL CHRISTOPHER L.;ORTH RICK J.;RAPPE KENNETH G.;LESSOR DELBERT L.;JOSEPHSON GARY B. |
分类号 |
B01D53/50;B01D53/32;B01D53/68;B01D53/70;B01D53/79;C10L |
主分类号 |
B01D53/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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