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发明名称
Verwendung von Oxalylchlorid für die Herstellung chlorid-dotierter SiO2-Schichten auf Silikon-Substraten
摘要
申请公布号
DE69305251(T2)
申请公布日期
1997.02.13
申请号
DE19936005251T
申请日期
1993.05.27
申请人
OLIN CORP., CHESHIRE, CONN., US
发明人
MCGEARY, MICHAEL J., MERIDEN, CONNECTICUT 06450, US;BOEGLIN, HERMAN J., SOUTH MERIDEN, CONNECTICUT 06450, US
分类号
C23F1/44;H01L21/00;H01L21/316;(IPC1-7):H01L21/316;C23F1/00
主分类号
C23F1/44
代理机构
代理人
主权项
地址
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