发明名称 PLASMA PROCESSOR
摘要 <p>The reactor 1 has an upper end portion attached with a ring member 10 supporting an annular seal plate 4. The ring member 10 has an upper surface attached with a cylindrical block member 25 screwed to the ring member 10. The block member 25 has a portion opposing the annular seal plate 4, the portion being formed with an annular waveguide antenna portion 12. The annular waveguide antenna portion 12 has a bottom portion fitted by an annular plate member 16 formed with a plurality of slits 15, 15 ... at a predetermined circumferential interval. A heating block 26 made of aluminum shaped into a cylindrical form is embedded detachably within the block member 25. The heating block 26 has a bottom surface detachably attached with an electrode 18 by screws. The electrode 18 is earthed. According to the plasma processing apparatus with such a constitution as above, even if the reactor 1 has a large diameter, an overall size of the apparatus can be made as small as possible, making possible to install within a small space. Further, directivity of ions entering into a work is improved, and life of the reactor 1 becomes long. <IMAGE></p>
申请公布号 EP1006761(A4) 申请公布日期 2007.05.16
申请号 EP19990925410 申请日期 1999.06.21
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUMOTO, NAOKI
分类号 H05H1/46;C23C16/511;C23F4/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):H05H1/46;H01L21/306;C23C16/50 主分类号 H05H1/46
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