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经营范围
发明名称
METHOD OF REMOVING THE ION IMPLANTED PHOTORESIST
摘要
申请公布号
KR100721207(B1)
申请公布日期
2007.05.16
申请号
KR20060044745
申请日期
2006.05.18
申请人
HYNIX SEMICONDUCTOR INC.
发明人
HAN, JI HYE
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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