| 摘要 |
PURPOSE: A semiconductor manufacturing device increases a chamber cleaning period, and enhances a semiconductor installation capacity by using electric field /magnetic field control device. CONSTITUTION: A semiconductor manufacturing device for performing a plasma etching process includes a chamber(12), and a coil(16) applying a power to the chamber. A shield(26) is mounted between the chamber and the coil. Electric field is generated in a direction of the coil. Magnetic field is generated perpendicular to the electric field. The shield adjusts the intensity of the magnetic field and electric field. Thereby, the semiconductor manufacturing device increases a chamber cleaning period, and enhances a semiconductor installation capacity by using electric field /magnetic field control device.
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