发明名称 COMPOUND AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide compounds as raw materials for resist compositions, and to provide a method for producing the compounds. <P>SOLUTION: The method comprises the following process. A compound is synthesized by condensing a dimethylphenol with bis[4-(t-butoxycarbonylmethyloxy)-3-formyl]diphenylmethane, and the resultant compound is hydrolyzed to obtain the corresponding carboxylic acid. This carboxylic acid and adamantyloxymethyl esters thereof are to be used as raw materials for polymers for resists with slight surface roughness. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007112777(A) 申请公布日期 2007.05.10
申请号 JP20050320551 申请日期 2005.11.04
申请人 TOKYO OHKA KOGYO CO LTD 发明人 SHIONO HIROHISA;DAZAI NAOHIRO;HIRAYAMA HIROSHI;KASAI KOHEI;HANEDA HIDEO
分类号 C07C59/68;C07B61/00;C07C51/353;C07C59/72;C07C67/10;C07C69/736;G03F7/004;G03F7/023;G03F7/039 主分类号 C07C59/68
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