| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is a chemical amplifying type resist having excellent both dry etching resistance and PEB (post exposure bake) temperature dependence and excellent basic properties as a resist such as sensitivity, resolution and depth of focus and to provide a copolymer used in the composition. <P>SOLUTION: The copolymer has (a) a repeating unit having a naphthalene skeleton, (b) a repeating unit having an acid dissociating group protected with a protective group eliminable by actions of an acid and becoming an alkali-soluble site when eliminating the protective group in which the sum total of the number of carbon atoms and the number of oxygen atoms composing the protective group is ≤10 and (c) a ≥5C repeating unit having the alkali-soluble site [with the proviso that the (a), (b) and (c) are repeating units of different structures, respectively]. The copolymer has 1,000-500,000 weight-average molecular weight. <P>COPYRIGHT: (C)2007,JPO&INPIT |
