发明名称 PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND METHOD FOR MANUFACTURING MICRODEVICE
摘要 <p>A catadioptric optical system which facilitates optical adjustment and mechanical design, fully corrects aberrations beginning with chromatic aberrations and achieves a high resolution of 0.1 mu m or less, and includes the first imaging optical system (G1) for forming the first intermediate image of the first surface (R), the first folding mirror (1) arranged in vicinity of the first intermediate image, the second imaging optical system (G2) having a concave mirror (CM) and at least one negative power lens (3), the second folding mirror (2), and the third imaging optical system (G3) . A reflecting surface of the first folding mirror and A reflecting surface of the second folding mirror are positioned so that they do not overlap spatially. <IMAGE></p>
申请公布号 KR20070048276(A) 申请公布日期 2007.05.08
申请号 KR20077008647 申请日期 2007.04.16
申请人 NIKON CORPORATION 发明人 OMURA YASUHIRO;SHIRAISHI NAOMASA;OWA SOICHI
分类号 G03F7/20;G02B13/24;G02B17/08;H01L21/027 主分类号 G03F7/20
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