| 摘要 |
A method for the protection of an optical element of a lithographic apparatus including the optical element and a source of radiation includes providing a material including one or more elements selected from B, C, Si, Ge and/or Sn, and arranging the material such that the source, in use, causes removal of at least part of the material, thereby providing depositable material, and such that at least part of the depositable material deposits on the optical element.
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