| 发明名称 |
A NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS. |
| 摘要 |
THE PRESENT INVNETION RELATES TO A NOVEL POLYMER COMPRISING AT ELAST ONE UNIT DERIVED FROM AN ETHYLENICALLY UNSATURATED COMPOUND CONTAINING AT LEAST ONE CYANO FUNCTIONALLY AND AT LEAST ONE NONAROMATIC CYCLIC UNIT. THE NOVEL POLYMER IS PARTICULARLY USEFUL WHEN USED IN A PHOTORESIST COMPOSITION SENSITIVE IN THE DEEP ULTRAVIOLET REGION.
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| 申请公布号 |
MY129646(A) |
申请公布日期 |
2007.04.30 |
| 申请号 |
MYPI20021679 |
申请日期 |
2002.05.09 |
| 申请人 |
AZ ELECTRONIC MATERIALS (JAPAN) K.K. |
发明人 |
RALPH R. DAMMEL;RAJ SAKAMURI |
| 分类号 |
C08F120/42;C08F220/42;C08F6/12;C08F222/32;C08F232/08;G03F7/004;G03F7/038;G03F7/039 |
主分类号 |
C08F120/42 |
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