| 发明名称 |
INTEGRATED LOW-K HARD MASK |
| 摘要 |
<p>Embodiments of the invention provide a device with a hard mask layer between first and second ILD layers. The hard mask layer may have a k value approximately equal to the first and/or second ILD layers.</p> |
| 申请公布号 |
KR20070044495(A) |
申请公布日期 |
2007.04.27 |
| 申请号 |
KR20077006129 |
申请日期 |
2007.03.16 |
| 申请人 |
INTEL CORP. |
发明人 |
KING SEAN;OTT ANDREW |
| 分类号 |
H01L21/768;H01L21/4763;H01L23/532 |
主分类号 |
H01L21/768 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
