PLASMA-DISCHARGE PROCESSING APPARATUS AND METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a plasma-discharge processing apparatus and method therefor whereby the density of atomic oxygen radicals is improved properly and the control of a plasma-discharge processing is made at a low cost, in the plasma-discharge processing performed under a nearly atmospheric pressure by using the mixed gas of nitrogen and oxygen gases.

SOLUTION: The plasma-discharge processing apparatus 1 for performing a plasma-discharge processing under a nearly atmospheric pressure by using the mixed gas of nitrogen and oxygen gases has: a pair of opposite electrodes 2, 3 whose gap is used as a discharging space 9; a voltage applying device 4 for applying a voltage to both or one of the opposite electrodes 2, 3; a gas feeding device 5 for feeding the mixed gas to the discharging space 9; a spectroscope 7 for measuring by a luminous-spectrum analyzing method the luminous intensity of the mixed gas brought into a plasma; and a controller 8 for adjusting processing conditions on the basis of the luminous intensity of a specific wavelength corresponding to the peak of the luminous spectrum of nitrogen monoxide of the measured luminous intensities to make the processing apparatus 1 perform the plasma-discharge processing.

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