发明名称 Gas shower, lithographic apparatus and use of a gas shower
摘要 A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical path, the gas distribution chamber being configured to distribute the gas to the optical path, wherein the gas distribution chamber includes a substantially sharp tapered tip.
申请公布号 US2007090301(A1) 申请公布日期 2007.04.26
申请号 US20050255195 申请日期 2005.10.21
申请人 ASML NETHERLANDS B.V. 发明人 VAN EMPEL TJARKO ADRIAAN R.;HAM RONALD V.D.;ROSET NIEK JACOBUS J.
分类号 G01N21/01 主分类号 G01N21/01
代理机构 代理人
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