| 发明名称 |
Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography |
| 摘要 |
A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
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| 申请公布号 |
US7209216(B2) |
申请公布日期 |
2007.04.24 |
| 申请号 |
US20050089539 |
申请日期 |
2005.03.25 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DE JAGER PIETER WILLEM HERMAN;VAN DEN AKKER THEODORUS LEONARDUS;VENEMA WILLEM JURRIANUS;MULCKHUYSE WOUTER FRANS WILLEM;KESSELS LAMBERTUS GERARDUS MARIA |
| 分类号 |
G03B27/42;G03B27/54 |
主分类号 |
G03B27/42 |
| 代理机构 |
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代理人 |
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