SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM

摘要

Provided is a substrate processing apparatus, in which a processing liquid is supplied to a substrate W held horizontally by a substrate holding unit. A processing liquid passing portion includes a passing surface that is provided between the substrate W and a recovery cup provided around the substrate W such that the processing liquid flows on the passing surface. Light for concentration detection is projected from a light projection unit to the passing surface, and a concentration detection unit detects a concentration of the processing liquid based on a result of receiving the reflected light of the light by a light receiving unit.

主权项

1. A substrate processing apparatus comprising:
a substrate holding unit that is configured to hold a substrate horizontally; a first processing liquid supply unit that is configured to supply a first processing liquid to a substrate held by the substrate holding unit; a recovery cup that is provided around the substrate held by the substrate holding unit, and configured to receive the first processing liquid after the first processing liquid is supplied to the substrate; a processing liquid flowing portion that includes a passing surface that is provided between the substrate held by the substrate holding unit and the recovery cup such that the first processing liquid flowing out from the substrate flows on the passing surface; and a concentration detection unit that includes a light projection unit configured to project light for concentration detection to the passing surface and a light reception unit configured to receive light reflected on the passing surface, the concentration detection unit being configured to detect a concentration of the first processing liquid, based on information obtained from the light reception unit.