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发明名称
IN SITU SURFACE CONTAMINANT REMOVAL FOR ION IMPLANTING
摘要
申请公布号
KR20070041595(A)
申请公布日期
2007.04.18
申请号
KR20077004635
申请日期
2007.02.27
申请人
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人
WALTHER STEVE;MEHTA SANDEEP;VARIAM NAUSHAD;JEONG, U KYO
分类号
H01L21/265;H01L21/304
主分类号
H01L21/265
代理机构
代理人
主权项
地址
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