Etching process for manufacturing an electron exit window

摘要

Production of an electron beam hole comprises reducing the thickness of a foil made from titanium or glass by etching the foil using an etching solution. Independent claims are also included for the following: (1) electron beam hole produced by the above method; and (2) electron beam accelerator comprising a cathode, an accelerating anode, a high voltage source for producing an accelerating voltage between the anode and cathode and the above electron beam hole. Preferred Features: The foil is cleaned and degreased before etching, rinsed with caustic soda and water, and the remaining compounds are removed using a solution of sulfuric acid or a mixture of sulfuric acid and hydrogen peroxide.