发明名称 IMAGE EXPOSURE APPARATUS
摘要 <p>An image exposure apparatus is provided with a spatial light modulating element wherein irradiated light is modulated at each of two-dimensionally arranged pixel sections; a light source for irradiating the spatial light modulating element with light; a first optical system which collects the light passed through the spatial light modulating element and forms images of the pixel sections; a microlens array for forming images on a photosensitive material by the luminous flux passed through the first optical system from the pixel sections by means of a plurality of two-dimensionally arranged microlenses; a positional shift detecting means for detecting a relative positional shift of the photosensitive material and the light from the microlens array; and a microlens array moving means for moving the microlens array based on the positional shift detected by the positional shift detecting means.</p>
申请公布号 WO2007040165(A1) 申请公布日期 2007.04.12
申请号 WO2006JP319420 申请日期 2006.09.29
申请人 FUJIFILM CORPORATION;ISHII, SHUICHI;OZAKI, TAKAO;TAKADA, NORIHISA 发明人 ISHII, SHUICHI;OZAKI, TAKAO;TAKADA, NORIHISA
分类号 G03F7/20;B41J2/46 主分类号 G03F7/20
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