| 摘要 |
PROBLEM TO BE SOLVED: To provide a rotation compensating device of a processed substrate, which allows uniformity of a resist size in a surface of the processes substrate to be enhanced. SOLUTION: This rotation compensating device ARM of the processed substrate compensates the direction of the processed substrate W provided with a chemical amplification type resist film on its surface, in which an exposure region having a latent image pattern is formed by irradiating an energy line so that a dose become small along one direction in order, so as to flow an air stream along the direction where the dose of an energy line becomes small within the chemical amplification type resist film, when the chemical amplification type resist film is heated, passing the air stream along one direction along the processed substrate in prior to developing the chemical amplification type resist film. COPYRIGHT: (C)2007,JPO&INPIT
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