METHOD FOR PRODUCING HIGH-PURITY MOLYBDENUM-TUNGSTEN ALLOY POWDER USED FOR RAW POWDER FOR SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a high-purity molybdenum-tungsten alloy powder suitable for a raw powder to be used when producing a sputtering target for forming a film of a liquid crystal and a semiconductor. SOLUTION: The method for producing the high-purity molybdenum-tungsten alloy powder to be used as the raw powder for a sputtering target comprises the steps of: mixing each solution of ammonium salts of molybdenum and tungsten to prepare a mixture of the ammonium salts; calcining the mixture of the ammonium salts to prepare a complex oxide of molybdenum and tungsten; and reducing the complex oxide to obtain the high-purity molybdenum-tungsten alloy powder in which molybdenum and tungsten are uniformly solid-dissolved in each other. COPYRIGHT: (C)2007,JPO&INPIT