<p>[PROBLEMS] To control the edge position of an exposure image with high precision in an exposure method wherein a DMD arranged with a large number of micromirrors is moved relative to a substrate and exposure point groups are sequentially formed on the substrate depending on the movement thus exposing an exposure image. [MEANS FOR SOLVING PROBLEMS] Edge position of an exposure image on a substrate is controlled by controlling the exposure state of at least one micromirror out of a plurality of micromirrors forming the edge of the exposure image.</p>
