发明名称 |
POLISHING SLURRIES AND METHODS FOR UTILIZING SAME |
摘要 |
A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and the hard abrasive particles have a Mohs hardness of not less than 8, and wherein the soft abrasive particles and the hard abrasive particles are present at a weight ratio of not less than 2: 1. |
申请公布号 |
WO2007041199(A2) |
申请公布日期 |
2007.04.12 |
申请号 |
WO2006US37825 |
申请日期 |
2006.09.29 |
申请人 |
SAINT-GOBAIN CERAMICS & PLASTICS, INC.;LACONTO, RONALD W.;HAERLE, ANDREW G. |
发明人 |
LACONTO, RONALD W.;HAERLE, ANDREW G. |
分类号 |
C09G1/02 |
主分类号 |
C09G1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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