| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate capable of easily forming a required configuration from a substrate slow in etching speed, the manufacturing method of a substrate which forms a metal film employing non-electrolytic plating, and a crystal oscillating piece, a gyroscope oscillating piece and the substrate for indication which are manufactured by these manufacturing methods. <P>SOLUTION: A metal film 30 is formed as a third film in a region wherein a photo resist 20 is not formed on a metal film 10 and the metal film 10 is exposed. This forming method is a non-electrolytic plating method of metal. The non-electrolytic plating method does not necessitate to make an electric current to flow through a plated member (a crystal substrate 1 is a member in this embodiment), and this method applies the plated film of metal (it is the metal film 30 in this embodiment) on the member to be plated based on a chemical reduction method. <P>COPYRIGHT: (C)2007,JPO&INPIT |
