发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.
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申请公布号 |
US7202934(B2) |
申请公布日期 |
2007.04.10 |
申请号 |
US20040015770 |
申请日期 |
2004.12.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MOORS JOHANNES HUBERTUS JOSEPHINA;HAM ERIK LEONARDUS;HEERENS GERT-JAN;LIEBREGTS PAULUS MARTINUS MARIA;LOOPSTRA ERIK ROELOF;WERIJ HENRI GERARD CATO |
分类号 |
G03B27/52;G03B27/42;G03F7/00 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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