METHOD OF DEPOSITING AN ATOMIC LAYER,申请号KR20050093468-传众专利搜索

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发明名称	METHOD OF DEPOSITING AN ATOMIC LAYER
摘要
申请公布号	KR20070038294(A)	申请公布日期	2007.04.10
申请号	KR20050093468	申请日期	2005.10.05
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	KANG, SUNG HO;HA, SANG CHEOL;JEON, KYO JUN;LEE, KWANG YOUNG;KIM, YOUNG MIN;JEON, DU HAN
分类号	H01L21/20	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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